Sub-nanometer polishing of single crystal diamond
Sub-nanometer polishing of single crystall diamond.

Single crystal diamond substrates as supplied from several different manufacturers often exhibits significant top surface defects, such as pits and other large vacancies which result in a typical surface roughness of >2nm Ra as measured by Atomic Force Microscopy  (AFM). Diamond Product Solutions is able to polish these diamond plates down to sub-nanometer roughness, including optical and electronic grade material. Our polishing process developed here at Diamond Product Solutions can achieve a surface with very homogeneous roughness down toa s low as 0.2 nm, as verified by AFM measurement performed at the University of Glasgow, School of Engineering, UK.

Below and above are AFM scans taken over a 5um surface area of optical grade single crystal diamond plates,showing the improvement in surface roughness before and after polishing as well as achieving a very flat and parallel diamond plane. Images courtesy of Kevin G. Crawford , University of Glasgow, UK.

Single Crystal EG  E6 diamond polished to sub-nanometer roughness
Single crystal E6 diamond polished to sub-nanometer roughness
Surface structure of single crystal diamond as delivered
Surface structure of single crystal diamond as delivered.
Surface structure of single crystal diamond after post-polishing.
Surface structure of single crystal diamond after post-polishing.


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